氢气净化清洁系统;型号 #, HP-100-Purge;能力 SLPM, 47;大小 WxHxD(in), 18x10x19 Hydrogen Purifer Purge System;Model

氢气净化清洁系统;型号 #, HP-50-Purge;能力 SLPM, 24;大小 WxHxD(in), 18x10x19 Hydrogen Purifier Purge System;Model

氢气净化清洁系统;型号 #, HP-25-Purge;能力 SLPM, 12;大小 WxHxD(in), 18x10x19 Hydrogen Purifier Purge System;Model

氢气净化清洁系统;型号 #, HP-10-Purge;能力 SLPM, 5;大小 WxHxD(in), 18x10x19 Hydrogen Purifier Purge System;Model #

二氯[1,1'-双(二-苯基膦基)二茂铁]钯(II),二氯甲烷复合物(1:1),Pa 13% 95464-05-4 Dichloro[1,1'-bis(diphenylphosphino)ferroc

氧去除剂, OR-600 Oxygen remover, OR-600

氧去除剂, OR-300 Oxygen remover, OR-300

铂 钌 黑, 正常 Pt 50%, Ru 50% (Atomic wt%), HiSPEC^t 6000 Platinum Ruthenium black, nominally Pt 50%, Ru

氧化锆/氧化钇靶, 76.2mm (3.0in) 直径 x 6.35mm (0.25in) 厚, 99.9% (metals basis ex. Hf) Zirconium oxide/Yttriu

氧化锆/氧化钇靶, 76.2mm (3.0in) 直径 x 3.18mm (0.13in) 厚, 99.9% (metals basis ex. Hf) Zirconium oxide/Yttriu

氧化锆/氧化钇靶, 50.8mm (2.0in) 直径 x 6.35mm (0.25in) 厚, 99.9% (metals basis ex. Hf) Zirconium oxide/Yttriu

氧化锆/氧化钇靶, 50.8mm (2.0in) 直径 x 3.18mm (0.13in) 厚, 99.9% (metals basis ex. Hf) Zirconium oxide/Yttriu

氧化钽(V)溅射靶, 76.2mm (3.0in) 直径 x 6.35mm (0.250in) 厚, 99.9% (metals basis) Tantalum(V) oxide sputterin

氧化钽(V)溅射靶, 76.2mm (3.0in) 直径 x 3.18mm (0.125in) 厚, 99.9% (metals basis) Tantalum(V) oxide sputterin

氧化钽(V)溅射靶, 50.8mm (2.0in) 直径 x 6.35mm (0.250in) 厚, 99.9% (metals basis) Tantalum(V) oxide sputterin

氧化钽(V)溅射靶, 50.8mm (2.0in) 直径 x 3.18mm (0.125in) 厚, 99.9% (metals basis) Tantalum(V) oxide sputterin

氧化铟锡溅射靶, 76.2mm (3.0in) 直径 x 6.35mm (0.25in) 厚, 10% wt, 99.99% (metals basis) 50926-11-9 Indium tin

氧化铟锡溅射靶, 76.2mm (3.0in) 直径 x 3.18mm (0.13in) 厚, 99.99% (metals basis) 50926-11-9 Indium tin oxide sp

氧化铟锡溅射靶, 50.8mm (2.0in) 直径 x 6.35mm (0.25in) 厚, 99.99% (metals basis) 50926-11-9 Indium tin oxide sp

氧化铟锡溅射靶, 50.8mm (2.0in) 直径 x 3.18mm (0.13in) 厚, 99.99% (metals basis) 50926-11-9 Indium tin oxide sp