铕溅射靶, 76.2mm 直径 x 1.59mm 厚 7440-53-1 Europium sputtering target, 76.2mm dia x 1.59mm thick

铽溅射靶, 76.2mm 直径 x 1.59mm 厚 7440-27-9 Terbium sputtering target, 76.2mm dia x 1.59mm thick

镱溅射靶, 76.2mm 直径 x 1.59mm 厚 7440-64-4 Ytterbium sputtering target, 76.2mm dia x 1.59mm thick

铕溅射靶, 76.2mm 直径 x 3.18mm 厚 7440-53-1 Europium sputtering target, 76.2mm dia x 3.18mm thick

铽溅射靶, 76.2mm 直径 x 3.18mm 厚 7440-27-9 Terbium sputtering target, 76.2mm dia x 3.18mm thick

镱溅射靶, 76.2mm 直径 x 3.18mm 厚 7440-64-4 Ytterbium sputtering target, 76.2mm dia x 3.18mm thick

钯, 10%负载于活性炭粉末, Type 87L,标准, 还原的,通常含水50% Palladium, 10% on activated carbon powder, Type 87L, standa

钯, 10%负载于活性炭粉末, Type 87L,标准, 还原的,通常含水50% Palladium, 10% on activated carbon powder, Type 87L, standa

5% 钯 负载于活性炭浆料 7440-05-3 Palladium, 5% on activated carbon paste, 5R394

5% 钯 负载于活性炭浆料 7440-05-3 Palladium, 5% on activated carbon paste, 5R394

钬粉, -200目, 99.9% (REO) 7440-60-0 Holmium powder, -200 mesh, 99.9% (REO)

镝粉, -200目, 99.9% (REO) 7429-91-6 Dysprosium powder, -200 mesh, 99.9% (REO)

QuadraPure^t AMPA, 350-750 micron, metal scavenger QuadraPure^t AMPA, 350-750 micron, metal scavenge

钆粉, -200目, 99.9% (REO) 7440-54-2 Gadolinium powder, -200 mesh, 99.9% (REO)

钕粉, -200目, 99.9% (REO) 7440-00-8 Neodymium powder, -200 mesh, 99.9% (REO)

镨粉, -200目, 99.9% (REO) 7440-10-0 Praseodymium powder, -200 mesh, 99.9% (REO)

铈粉, -200目, 99.9% (REO) 7440-45-1 Cerium powder, -60 mesh, 99.9% (REO)

镧粉, -200目, 99.9% (REO) 7439-91-0 Lanthanum powder, -200 mesh, 99.9% (REO)

聚(3-己基噻吩-2,5-二基), 区域无规 104934-50-1 Poly(3-hexylthiophene-2,5-diyl), regiorandom

金纳米颗粒, APS 20-25nm, 99.95+% (metals basis) 7440-57-5 Gold nanopowder, APS 20-25nm, 99.95+% (metals b