氧化钽(V)溅射靶, 76.2mm (3.0in) 直径 x 6.35mm (0.250in) 厚, 99.9% (metals basis) Tantalum(V) oxide sputterin

氧化钽(V)溅射靶, 76.2mm (3.0in) 直径 x 3.18mm (0.125in) 厚, 99.9% (metals basis) Tantalum(V) oxide sputterin

氧化钽(V)溅射靶, 50.8mm (2.0in) 直径 x 6.35mm (0.250in) 厚, 99.9% (metals basis) Tantalum(V) oxide sputterin

氧化钽(V)溅射靶, 50.8mm (2.0in) 直径 x 3.18mm (0.125in) 厚, 99.9% (metals basis) Tantalum(V) oxide sputterin

氧化铟锡溅射靶, 76.2mm (3.0in) 直径 x 6.35mm (0.25in) 厚, 10% wt, 99.99% (metals basis) 50926-11-9 Indium tin

氧化铟锡溅射靶, 76.2mm (3.0in) 直径 x 3.18mm (0.13in) 厚, 99.99% (metals basis) 50926-11-9 Indium tin oxide sp

氧化铟锡溅射靶, 50.8mm (2.0in) 直径 x 6.35mm (0.25in) 厚, 99.99% (metals basis) 50926-11-9 Indium tin oxide sp

氧化铟锡溅射靶, 50.8mm (2.0in) 直径 x 3.18mm (0.13in) 厚, 99.99% (metals basis) 50926-11-9 Indium tin oxide sp

碳化硼溅射靶, 50.8mm (2.0in) 直径 x 6.35mm (0.250in) 厚, 99.5% (metals basis) Boron carbide sputtering targe

四氨合溴化钯(II), Premion®, 99.95% (metals basis), Pd 31.3%最低 44463-62-9 Tetraamminepalladium(II) bromide,

硫酸铑(III)四水合物, Premion®, 99.99% (metals basis), Rh 35.9% 最低 15274-78-9 Rhodium(III) sulfate tetrahydr

硫酸铑(III)四水合物, Premion®, 99.99% (metals basis), Rh 35.9% 最低 15274-78-9 Rhodium(III) sulfate tetrahydr

硫酸铑(III)四水合物, Premion®, 99.99% (metals basis), Rh 35.9% 最低 15274-78-9 Rhodium(III) sulfate tetrahydr

六氯铑(III)酸钾, Premion®, 99.99% (metals basis), Rh 23.3% 最低 13845-07-3 Potassium hexachlororhodate(III)

六氯铑(III)酸钾, Premion®, 99.99% (metals basis), Rh 23.3% 最低 13845-07-3 Potassium hexachlororhodate(III)

六氯铑(III)酸钾, Premion®, 99.99% (metals basis), Rh 23.3% 最低 13845-07-3 Potassium hexachlororhodate(III)

六溴铱(IV)酸钾, 99.9% (metals basis), Ir 25.2% 最低 19121-78-9 Potassium hexabromoiridate(IV), 99.9% (metal

六溴铱(IV)酸钾, 99.9% (metals basis), Ir 25.2% 最低 19121-78-9 Potassium hexabromoiridate(IV), 99.9% (metal

六水合六溴铱(IV)酸, 99.9% (metals basis), Ir 24.1% 最低 Dihydrogen hexabromoiridate(IV) hexahydrate, 99.9% (

六水合六溴铱(IV)酸, 99.9% (metals basis), Ir 24.1% 最低 Dihydrogen hexabromoiridate(IV) hexahydrate, 99.9% (